RTP stands for Rapid Thermal Processing, a technique used in the semiconductor industry to modify the properties of thin films on substrates by heating them to high temperatures for a short time. RTP is used to anneal, crystallize, and activate dopants in the films, among other applications. The process is typically performed in a vacuum or in a controlled gas atmosphere to prevent oxidation of the films. RTP systems can be customized with various configurations, such as single or multiple wafer processing, and different heating methods, such as radiant, lamp, or laser heating. RTP is a crucial step in the fabrication of advanced semiconductor devices with high performance and reliability.